Page 43 - Principles and Applications of NanoMEMS Physics
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1. NANOELECTROMECHANICAL SYSTEMS                               29


                Figures 1-27(a) and (b) show the  layer structures  of  MBE-grown
             heterostructure  bipolar transistor (HBT)  and resonant tunneling  diodes
             (RTD), respectively.

                                                               19
                                                               19
                             m
                                                          =1x
                        1 100 nm   G  a I n A  s  C  o n t a c t  n=1x10 cm  -3 -3
                                   G aInA s C o ntact
                         0
                                                         n
                            n
                                                             10
                                                                cm
                          0
                                                               19
                          0
                            n
                             m
                         7 70 nm   A  l In A  s  E m i t t e r  C o  nt a c t  n= 1 x1 0 0  19
                                                          =
                                                           1
                                                            x1
                                                         n
                                   A lInA s E m itter C o ntact
                                                               17
                                                             10
                          0
                                   A lInA s E m itter
                             m
                            n
                                                          =8x
                        1
                         2
                        120 nm     A  l I n A  s  E m i t t e r  n n=8x10  17
                                                               17
                                            on
                                    o
                                           i
                                                             10
                                          t
                             m
                         3 30 nm   C o m positional G rade e  n n=8x10  17
                                   C
                                                G

                                               l
                                                 r
                                              a
                                                          =8x
                                                  a
                                                   d
                                       p
                                     m
                                        o
                                          i
                          0
                            n
                                         s
                                                               18
                                                         p= 2x1 0
                            nm
                                   G aInA s Spacer
                         10 nm     G  a I n A  s  S pac e r  p= 2 x 1 0  18
                         1
                          0
                                                               19
                                                         p=
                                   G aInA s B ase
                                                            x
                         6 60 nm   G  a I n A  s  B a s e  p= 2x1 0 0  19
                            nm
                                                             1
                                                           2
                          0
                                                               17
                            nm
                                   G aInA s Spacer
                                                         p= 5x1 0
                          0
                         2
                         20 nm     G  a I n A  s  S pac e r  p= 5 x 1 0  17
                                                               17
                             m
                          0
                                                             10
                            n
                                                          =1x
                                   G aInA s Spacer
                         5 50 nm   G  a I n A  s  S p a c e r  n n=1x10  17
                                                               16
                                         l
                                                             10
                                          e
                                            or
                                                         n
                                            t
                                           c
                                                          =3x
                          0
                                   n
                            n
                         5
                        7 750 nm   InP C ollector        n=3x10  16
                                   I
                                     P
                                        o
                                      C
                                         l
                             m
                                                               19
                          0
                        7
                             m
                                                          =1x
                                                         n
                         0
                        700 nm     G  a I n A  s  S  u b c ol l e c t o r  n=1x10  19
                            n
                                   G aInA s S ubcollector
                                                             10
                         10
                                   G aInA s B uffer
                         10 nm     G  a I n A  s  B  u f f e  r  U n do pe d
                             m
                            n
                                                         U ndoped
                                    InP S ubstrate
                                    In P  S u b  s t ra t e
                                            (a)
                              G aInAs contact (n+=5E18)   200 0Å
                               GaInAs spacer (n=5E17)     250 Å
                                GaInAs spacer (un d.)    15Å
                                    AlAs barrier          13Å
                               GaInAs/InAs/G aInA s we ll  12Å/30 Å/12 Å
                                    AlAs barrier          13Å
                                GaInAs spacer (un d.)     15Å
                               GaInAs spacer (n=1E17)    250Å
                            G aInAs contact laye r (n+=5E 18)  500 0Å
                                 G aInAs bu ffe r (und .)  100 Å
                             InP  sub strate  (semi-insu lating)
                                            (b)
             Figure 1-27. Layer description of MBE-grown devices. (a) InP double heterostructure bipolar
             transistor (DHBT) [39]. (b) Resonant tunneling diode (RTD) [40].
             1.2.3.4  Scanning Probe Microscopy
                Progress in Nanotechnology has been intimately related to the invention
             of a number of techniques for imaging and manipulating atoms/nanoparticles
             at nanoscales. All of these techniques  are  based  on  a  very  fine  tip  (with
             atomic  resolution),  and the  nature  of what is imaged  or manipulated is  a
             function of the tip itself, i.e., whether it is conductive, insulating, magnetic,
             non-magnetic, etc.  Excellent review  articles summarizing  advances  in
             scanning probe microscopy has been published recently by Giessibl [41] and
             Baski [42].  In  this section we focus on two of the main such techniques,
             namely: 1) The scanning tunneling microscope (STM); 2) The atomic force
             microscope (AFM).
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