Page 302 - An Introduction to Microelectromechanical Systems Engineering
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Index                                                                         281

           Sensors Magazine, 10                       Spin-on methods, 40
           Shape-memory alloys, 23–24                 Sputter deposition, 35–36
              actuation with, 85                        defined, 35
              critical temperature and, 23–24           directional randomness, 36
           Shocks, 251–52                               planar/cylindrical magnetron, 36
           Side-shooter nozzles, 87                   Stiction, 253
           Silicon, 13–19                             Stress isolation, 221–22
              amorphous, 14, 17–18                    SU-8 photosensitive epoxy, 61–62
              crystalline, 14–17                        defined, 61
              defined, 13                               structures, 62
              interactions, 18                          use of, 62
              mechanical integrity and, 18            Supercritical drying, 60–61
              micromachining, 33                      Surface-micromachined variable capacitors,
              microstructures, 14                            192–97
              optical reflectivity, 18                  design, 194
              polysilicon, 14, 17–18                    etch holes, 195
              properties, 14                            fabrication, 192–93, 194
              surface oxidation, 18                     implementations, 193
              as thermal conductor, 18                  in portable applications, 193
           Silicon carbide, 22                          versions, 193
           Silicon dioxide, 38–39                       See also Capacitors
           Silicon direct bonding, 56–57              Surface micromachining
              defined, 56                               polysilicon, 69–71
              performance, 56                           schematic illustration, 70
              process, 56–57                            systems of materials for, 70
           Silicon-fusion bonding, 94                 Surface mount technologies (SMT), 217
           Silicon fusion bonding with reactive ion   Switches, 211–14
                   etching (SFB-DRIE), 71               cantilever, 212, 213–14
              defined, 71                               desirable parameters, 211
              high aspect ratio, 71                     membrane, 212, 213
              illustrated, 72                           prototypes, 211
           Silicon nitride, 19                          See also RF MEMS
              deposition of, 39–40
              LPCVD, 48                               T
           Silicon-on-sapphire (SOS) wafers, 35       Tape peel test, 253
           Silicon oxide, 19
                                                      TaqMan tagging, 175, 176
           Silk screening. See Screen printing        Tetramethyl ammonium hydroxide (TMAH),
           Single-crystal reactive etching and               48, 112
                   metallization (SCREAM) process,    Thermal actuation, 84
                   72–74
                                                      Thermal failures, 254
              defined, 72                             Thermal inkjet heads, 116–19
              development, 74
                                                        concept, 117
              illustrated, 74                           fabrication, 117–18
           Sliding plate microvalve, 124–26             fabrication illustration, 118
              defined, 124                              nozzles, 116
              designs, 126                            Thermal management, 220–21
              fabrication, 126                        Thermoelectric coolers (TECs), 29
              schematic cross section, 125            Thermoelectricity, 29–30
              See also Micromachined valves
                                                      Thermosonic gold bonding, 228
           Small Times Magazine, 10                   Thin metal films, 20–21
           Soft lithography, 66–67                      choice of, 20
           Sol-gel process, 58
                                                        etching, 44
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