Page 96 - Sami Franssila Introduction to Microfabrication
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Thin-film Growth and Structure 75

















                                       (a)                        (b)
           Figure 7.2 Thin-film growth modes: (a) 2D (layer-by-layer) and (b) 3D (island) growth. Early stage and coalescence






                                                               Zone 3
                                                      Zone 2


                                          Zone 1                        1.0
                                                    Zone 1             0.9
                                30                                0.7 0.8
                                                               0.6
                                     20                      0.5
                                   Argon  10            0.3 0.4
                                  pressure            0.2   Substrate
                                  (mTorr)       1   0.1  temperature  (T/T )
                                                                      m
           Figure 7.3 A zone model of sputtered thin-film microstructure. Reproduced from Thornton, J.A. (1986), by permission
           of American Inst of Physics

           electron spectroscopy or X-ray photoelectron spec-  on a surface. Islands merge eventually to form a
           troscopy (XPS) (which probe 1 or 2 nm deep), we  continuous layer. For PVD metal films this happens
           can distinguish the mechanisms: in 2D-growth mode;  at ca. 10 to 20 nm thickness (100–200 atomic layers).
           the signal from the substrate quickly dies out because  Films thinner than this are optically transparent but they
           the whole surface becomes covered by the deposited  can be electrically conductive (percolated). Such films
           layer. In 3D-mode, the substrate signal slowly decreases  have applications as permeable electrodes in gas sensors
           as the proportion of open substrate area is dimin-  and as top metals in optical devices.
           ished.                                        Zone models of PVD explain the structure of thin
             In the initial stages of 3D-growth, numerous small  films (Figure 7.3). The first question is which materials
           nuclei are formed on the surface. This is a transformation  will form amorphous films and which will result in
           from vapour phase to solid phase. These small nuclei  (poly) crystalline films. Silicon and other covalently
           are mobile, and they grow by merging with other  bonding materials often end up as amorphous films, and
           nuclei, but they can also incorporate atoms from  many compounds and metal alloys with dissimilar-sized
           the vapour phase. Some of the impinging atoms re-  atoms similarly result in amorphous films. Elemental
           evaporate immediately and do not contribute to growth,  metal deposition usually results in polycrystalline films.
           and some small nuclei also re-evaporate. The nuclei  The crystallinity of the sputtered films is determined
           grow in size to become islands, but remain separate,  by complex interactions between the substrate (its
           and more nuclei can form on the area between the  chemical and structural features and temperature) and
           islands. Coalescence is driven by surface energy (and  the growing film. In the zone-model, pressure and
           surface area) minimization, like the droplet movement  temperature are the main variables to explain film
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