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                   96                        MEMS and Microstructures in Aerospace Applications


                   In contrast, ions passing through insulators and semiconductors are capable of
                   generating sufficient charge to cause noticeable radiation effects in devices such
                   as transistors and diodes.
                       Charge generated in insulators may become trapped at sites where they can reside
                   foralongtime.Theirpresencedistortsthelocalelectricfieldsandcanaffectthedensity
                   of carriers in the semiconductor near the interface. For instance, positive charge
                   trapped in the oxides used in the construction of a transistor will attract electrons in
                   the semiconductor to the interface. The increased concentration of electrons at the
                   field-oxide or semiconductor interface may lead to increased leakage currents in the
                   transistor, whereas positive charge trapped in the transistor’s gate oxide may prevent
                   the transistor from switching on and off, thereby causing functional failure.
                       The amount of trapped charge is a function of the TID, which increases with
                   exposure. Therefore, in space where devices are continuously exposed to radiation,
                   there is a steady increase in the amount of trapped charge that is first observed as an
                   increase in the leakage current and eventually a failure to operate.
                       TID effects in MEMS can originate in either the electronic or mechanical parts
                   of the device, or both. Whatever the origin, the essential requirement is that charge
                   be trapped in an insulator and that the trapped charge distort the existing electric
                   field to such an extent that the operation of the device is affected.
                       Electrons and holes generated by energetic ions passing near or through a
                   semiconductor metallurgical (n/p) junction will be separated by the associated
                   electric field. Charge separation disturbs the electrical potential across the junction,
                   and that voltage disturbance may propagate through the circuit to other nodes.
                   When the voltage disturbance occurs in a latch or a memory, the information stored
                   there may be nondestructively altered. The change in the state of the latch is known
                   as a single-event upset (SEU). It is called a SEU because a single particle interact-
                   ing with the material liberates sufficient charge to cause the effect. Of the many
                   different kinds of single event effects, those that occur when charge is deposited in
                   the semiconductor part of a device include single-event upset, single-event latchup,
                   single-event snapback, single-event transient, and single-event burnout. In some
                   cases, charge deposited in the gate oxide of a power MOSFET will lead to single-
                   event burnout. These types of effects are expected to occur in the electronic circuits
                   of MEMS but are unlikely to occur in the mechanical parts.

                   5.2.2 SPACE RADIATION INTERACTION WITH MATERIALS AND DEVICES
                          (DISPLACEMENT DAMAGE)

                   Particle radiation may also interact with the atomic nuclei of the materials through
                   which they pass. Those interactions consist of either elastic or inelastic nuclear
                   scattering events. In either case, the atomic nuclei of the constituent atoms recoil
                   and move away from their normal lattice sites, thereby disrupting the regular crystal
                                                          11
                   lattice, and producing vacancies and interstitials. Vacancies in semiconductors are
                   usually electrically active whereas interstitials are not. Electrically active sites act
                   as either short-lived traps or recombination centers for free carriers. Such traps
                   reduce minority carrier lifetimes and doping levels, causing certain devices, such as





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