Page 55 - A Practical Guide from Design Planning to Manufacturing
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The Evolution of the Microprocessor  31

        Silicon on insulator (SOI). SOI transistors, as shown in Fig. 1-14, build
        MOSFETs out of a thin layer of silicon sitting on top of an insulator. This
        layer of insulation reduces the capacitance of the source and drain
        regions, improving speed and reducing power. However, creating defect-
        free crystalline silicon on top of an insulator is difficult. One way to
        accomplish this is called silicon implanted with oxygen (SIMOX). In
        this method oxygen atoms are ionized and accelerated at a silicon wafer
        so that they become embedded beneath the surface. Heating the wafer
        then causes silicon dioxide to form and damage to the crystal structure
        of the surface to be repaired.
          Another way of creating an SOI wafer is to start with two separate
        wafers. An oxide layer is grown on the surface of one and then this
        wafer is implanted with hydrogen ions to weaken the wafer just beneath
        the oxide layer. The wafer is then turned upside down and bonded to a
        second wafer. The layer of damage caused by the hydrogen acts as a per-
        foration, allowing most of the top wafer to be cut away. Etching then
        reduces the thickness of the remaining silicon further, leaving just a thin
        layer of crystal silicon on top. These are known as bonded etched back
        silicon on insulator (BESOI) wafers. SOI is already in use in the
                                     ®
        Advanced Micro Devices (AMD ) 90-nm fabrication generation. 14
        Strained silicon. The ability of charge carriers to move through silicon
        is improved by placing the crystal lattice under strain. Electrons in the
        conduction band are not attached to any particular atom and travel
        more easily when the atoms of the crystal are pulled apart to create more
        space between them. Depositing silicon nitride on top of the source and
        drain regions tends to compress these areas. This pulls the atoms in the
        channel farther apart and improves electron mobility. Holes in the
        valence band are attached to a particular atom and travel more easily





                    Gate             SiO 2           Gate             SiO 2


         Source               Drain      Source                Drain  Si
                                     Si
                                                                      SiO 2

                  Bulk MOSFET                      SOI MOSFET
        Figure 1-14 Bulk and SOI MOSFETs. (Thompson, “MOS Scaling.”)



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           “AMD and 90nm Manufacturing.”
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