Page 209 - Microsensors, MEMS and Smart Devices - Gardner Varadhan and Awadelkarim
P. 209

TWO-PHOTON  MSL     189

       The resolution  of the super-IH process  is excellent  and is typically less than  1 um. The
     fabrication  speed  can  be increased  by  operating  the galvano scanning mirror  and  X-Y-Z
     stages together. The disadvantages  are that the optics system  is more  expensive  than  both
     the  IH  and  mass-IH  processes,  and  specialised  monomer  systems  need  to  be  developed
     for  each application.


     7.4  TWO-PHOTON MSL

     As  mentioned  earlier,  conventional  MSL  is  limited  in  terms  of  the  minimum  thickness
     of  the  resin  layers  possible  because  of  viscosity  and  surface tension  effects.  In  contrast,
     the  two-photon  MSL process  (like  the  super-IH) does  not have  this  problem  because  the
     resin  does  not  need  to be  layered.
       When  a  laser  beam  is  focused  on  a point  with  a  microscope  objective  lens  as shown
     in  Figure 7.22  (Maruo  and  Kawata  1998),  the  density  of  photons  decreases  with  the
     distance  away from  the focal plane,  but the total number of photons  in the  beam  at every
     cross  section  remains  the  same  (see  Figure  7.22(b)).  Thereafter,  the  resin  is  solidified
     completely  in the illuminated  region even  beyond  focal  point, leading to a poor  resolution;
     this  means  that  the  linear  response  of  the  materials  to  the  light  intensity  based  on  a
     single-photon  absorption  does  not  have  optical  sectioning  capability. On  the  other hand,
     if  the material response  is proportional  to the  square of the photon density, the integrated
     material response is enhanced greatly at the focal point (see Figure  7.22(c)), and, therefore,
     the polymerisation  based on two-photon  absorption  occurs  only  in a small  volume  within
     the  focal depth.  Normally, the  beam  power  of the  laser has  to be extremely high (several
     kilowatts)  to obtain  two-photon  absorption.
       A  two-photon  MSL  apparatus  is  shown  in  Figure  7.23  (Maruo  and  Kawata  1998).
     The  beam  is  generated  by  a  mode-locked  titanium  sapphire  laser  and  is  directed  by  two
     galvanic scanning  mirrors. The beam  is then focused  with an objective  lens into the resin.
     A  charge-coupled  device  (CCD)  camera  is used to  aid focusing and  monitor  the forming
     of  the  microstructure.  A  Z-stage  moves  the  resin  container  along  the  optical  axis  for
     multilayer  fabrication.  The  objective  lens  used  by  Maruo  had  a  numerical  aperture  of
     0.85  (magnification  of  40).  The  accuracy  of  the  galvano-scanner  set  (General scanning)

                                   Integration of the  Integration of the squared
                                  intensity of laser beam  intensity of laser beam
                  Optical






                      Focused laser beam
                           (a)          (b)

     Figure  7.22  Two-photon  absorption  and one-photon  absorption  generated  by a focused  laser:  (a)
     schematic  diagram  of  a focused  laser  beam;  (b) total  one-photon  absorption  per  transversal plane,
     which  is calculated  by integrating  the  intensity  over the plane versus  the optical  axis; and  (c)  total
     two-photon absorption per transversal plane, which is calculated by integrating the intensity squared
     over  the plane
   204   205   206   207   208   209   210   211   212   213   214