Page 337 - Book Hosokawa Nanoparticle Technology Handbook
P. 337

FUNDAMENTALS                            CH. 5 CHARACTERIZATION METHODS FOR NANOSTRUCTURE OF MATERIALS
                                                                 size from a few tens to hundreds of nm [4]. Fig. 5.6.1
                                                                 shows the growth mechanism schematically.  The
                                                                 crystal nuclei generated on the substrate surface at the
                                                                 initial stage grow along the surface keeping the crys-
                                                                 tal orientation against the substrate by the domain
                                                                 matching epitaxy [5] with the coinciding common
                                                                 multiplier of lattice constant of the substrate and the
                                                                 thin film. As the crystal lattices are not always con-
                                                                 nected coherently on the coalescence of crystal
                                                                 grains, incoherent grain boundaries occur.
                                                                  The incompleteness of crystallinity in the real
                                                                 space of nanostructure having grown in this way and
                                                                 expansion of diffraction peaks in the reciprocal space
                                                                 are explained in Fig. 5.6.2. Considering the crystallo-
                                                                 graphic tilting and the in-plane average size of the
                                                                 grains (average distance between the coherent grain
                                                                 boundaries) as a measure of the incompleteness of
                  Figure 5.5.17
                  Reconstructed image of TiO –Ag composites, showing the  crystalline, they give diffused pattern to all the dif-
                                      2
                  distribution of Ag particles [7].              fraction spots. Focusing on a plane in the reciprocal
                                                                 space, the crystallographic tilting gives the diffraction
                                                                 peak circularly diffused vertical to the reciprocal
                                                                 space vector and the finite grain size gives diffused
                                                                 spread in the direction parallel to the plane, of which
                                   References
                                                                 width is inversely proportional to grain size. As seen
                  [1] R.F. Egerton:  Electron Energy-Loss Spectroscopy in  from Fig. 5.6.2a, these spread directions overlap on
                     the Electron Microscope, Plenum Press, New York  the diffraction of the symmetric plane but meet at an
                     (1996).                                     angle with the asymmetric faces. Therefore it is pos-
                                                                 sible to measure the width of the crystallographic tilt-
                  [2] D.D. Vvedensky, D.K. Saldin and J.B. Pendry: Comput.
                                                                 ing of crystal grains and the grain size independently
                     Phys. Commun., 40, 421–440 (1986).
                                                                 by measuring the reciprocal space mapping of an
                  [3] J.C. Fuggle, J.E. Inglesfield:  Unoccupied Electronic
                                                                 asymmetric plane and dividing the spread width of
                     States, Springer-Verlag, Berlin (1992).
                                                                 diffraction spots in the individual directions.
                  [4] J. Bruley: Microsc. Micronanal. Microstruct., 4, 23–39  The evaluation of the structure of nanocrystalline
                     (1993).                                     film by this method is a very simple and direct method
                  [5] J.M. Titchmarsh: Micron, 30, 159–171 (1999).  without using the etching method or TEM observation.
                  [6] P.A. Midgley, M. Weyland:  Ultramicroscopy,  96,  Besides, it can evaluate the grain size as small as
                     413–451 (2003).                             10 nm, which is out of the range of X-ray topography.
                  [7] K. Kaneko, W.J. Moon, K. Inoke, Z. Horita, S. Ohara,  Actually, this method is reported to be useful for the
                                                                 investigation of grain boundary scattering of conduc-
                     T. Adschiri, H. Abe and M. Naito, Mater. Sci. Eng. A,
                                                                 tion electrons in the ZnO nanocrystalline films [6].
                     403, 30–36 (2005).
                                                                  Fig. 5.6.3 shows the dependence of electron mobility
                                                                 on the grain size in ZnO thin film grown on the c-plane
                  5.6 Evaluation methods for oxide               sapphire substrate under various preparation condi-
                                                                 tions. It is seen that the electron mobility decreases
                  heterostructures
                                                                 with the decreasing size because the double Schottky
                                                                 barrier formed due to deep level electrons trapped in
                  Two recent technologies for the evaluation of oxide  the grain boundaries acts as major scattering centers
                  heterostructures will be introduced in this section.  electronic conduction.  After annealing, the mobility
                  First a method to measure the in-plane grain size of  becomes independent of the grain size because the
                  ZnO epitaxial layer [1], which is expected to be  effect of Schottky barrier becomes weak in terms of
                  applied for an ultra-violet LED, by the X-ray recipro-  both the larger grain size and higher electron density.
                  cal space  mapping method [2] will be explained.  The relationship between the grain size and electric
                  Secondly, the  nanoprobe measuring method [3]  properties is relavant to the operating characteristics of
                  applied for evaluation of local electronic structure of  transparent transistors using ZnO polycrystalline film
                  the artificial superlattice consisting of perovskite  as a channel [7].
                  oxides will be briefly described. In the epitaxial  An interesting phenomenon has been found con-
                  growth of the system with large lattice mismatch like  cerning the incoherent grain boundary in ZnO thin
                  ZnO thin film on the c-plane sapphire substrate, the  film that it works as a cavity of laser emission [4]. The
                  thin film grows by coalescence of crystal grains of a  reciprocal space mapping with high resolution optics

                  312
   332   333   334   335   336   337   338   339   340   341   342