Page 267 - Semiconductor For Micro- and Nanotechnology An Introduction For Engineers
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Interacting Subsystems
                             objective. For n-doped and p-doped polysilicon wires in commercial
                             CMOS technology we can expect to achieve a maximum of
                             ε    =  900 µVK  – 1  , with typical values lying at half that value
                              ,
                              ii 1
                                –
                             [Nathan]. For design purposes, this implies that we need to ensure that
                             the hot and cold contacts are very well isolated from each other, which is
                             usually achieved by positioning the cold contacts on the bulk of the chip,
                             and the hot contacts on a thermally-isolated membrane. In addition, we
                             need many thermocouples in the thermopile, and typical designs have 50
                             or more pairs. Note that the large number of metal lines connecting the
                             thermally insulated hot and cold contacts is a misnomer, since metal is an
                             excellent conductor of heat. This makes the design of real thermopiles in
                             silicon technology very challenging, and requires the use of on-chip
                             amplification of the small voltages that arise when small temperature dif-
                             ferences have to be measured.


                Seebeck      Formal transport theory predicts the existence of the Seebeck effect, and
                Effect in    of course determines which mathematical form it should have. At the
                Silicon
                             microscopic level, the cause of the Seebeck effect in Silicon begins with
                             a non-local shift in the position of the Fermi level due to the temperature
                             gradient [7.9]. In hotter regions, the Fermi level is shifted closer towards
                             the middle or intrinsic position of the bandgap than in colder regions. At
                             the same time, the charge carriers in the hot regions have a higher veloc-
                             ity than in the cold regions. In this way the hot regions deplete somewhat,
                             and the cold regions gain in carrier concentration. There is also a net flow
                             of phonons from hot to cold regions.  The drag force exerted by the
                             phonons on the electrons further enhance the concentration of carriers
                             towards colder regions. The value of the Seebeck coefficient is computed
                             from material parameters as

                                                k B   N C  5    
                                         ε =  –  ----- ln  ------- +  --- +  s +  φ e   (7.71a)
                                                      n 
                                                q 
                                                               e
                                          e
                                                       e   2
                                               k B    N C  5    
                                          ε =  ----- ln  ------- +  --- +  s +  φ h   (7.71b)
                                                     n 
                                               q 
                                                              h
                                           h
                                                      h   2
                264          Semiconductors for Micro and Nanosystem Technology
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