Page 162 - Wire Bonding in Microelectronics
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Gold-Aluminum Intermetallic Compounds       139


              Noolu studied these volume transformations during  Au-Al phase
              changes. The essence of his work on intermetallics is that there are
              major differences in the five intermetallic lattice sizes. During ther-
              mal stress, a specific compound may transform into other compounds.
              In most cases the second compound is smaller or larger (by up to
              ~20%) than the first, and leaves cracks or stress behind. Once formed,
              a crack can propagate during temperature cycling. Also excess Al or
              Au can be released (or absorbed) as the compounds change. See the
              Noolu’s App. 5B for a description of this phenomena.
                  Silicon may form ternary compounds with Au and Al, but, as
              shown by Philofsky, these are no more detrimental to bond quality
              than the pure Au-Al compounds by themselves, and, in some cases,
              may be helpful.
                 These intermetallic compounds are not the normal cause of fail-
              ure. They are mechanically strong (although brittle) and electrically
              conductive. Bond failures result from the formation of Kirkendall
              voids, as well as from the susceptibility of Au-Al couples to degrada-
              tion by impurities or corrosion. The latter two causes are extensively
              discussed in following sections. Kirkendall voids form when either
              the Al or Au diffuses out of one region faster than it diffuses in from
              the other side of that region. Vacancies pile up and condenses to form
              voids, normally on the Au-rich side along the Au Al -to-Au interface.
                                                       5  2
              The rates of diffusion vary with temperature and with different
              phases and are dependent upon the adjacent phases, as well as the
              number of vacancies in the original metals.
                 Classical Kirkendall voids require bake times greater than an
              hour at temperatures greater than 300°C to occur on the Au-rich side
              (Au Al ), and greater than 400°C on the Al-rich side (AuAl ), or much
                 5  2                                         2
              longer times at lower temperatures [5-2, 5-3]. Such temperatures and
              times are seldom reached during modern bonding or modern device
              and systems packaging. Thus, it is rare that well-made bonds on
              integrated circuits used in normal environments actually fail due to
              the formation of  classical Kirkendall voids. However, the failures
              resulting from impurities (see Sec. 5.2), poor welding (see App. 5A),
              hydrogen, or other defects in plated  Au layers (see Chap. 6) can
              appear to have resulted from classical Kirkendall voiding. Thus, it is
              essential to understand the classical failure modes.

              5.1.3  The Classical Au-Al Compound Failure Modes
              An example of Au-Al compound formation is shown in Fig. 5-4. Here, a
              poorly formed ball-bond was subjected to high temperature, and the
              reaction generated considerable intermetallic compound. This particu-
              lar bond was both electrically conductive and mechanically strong
              (as later shown by a ball-shear test). Thus, the presence of these compounds
              will not necessarily cause bonds to fail. However, even if such bonds do
              not fail, the interface strength does degrade. The typical degradation of
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