Page 341 - Introduction to Information Optics
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6. Interconnection with Optics












                     Fig. 6.26. Photograph of surface-normal output coupling.


        that increasing the refractive index difference and optimizing the microstruc-
        ture of the grating could significantly improve coupling efficiency.
          The demonstration of surface-normal output coupling is shown in Fig. 6.26.
        The 1.3 /zm laser light was coupled into the guided mode by prism coupling
        and coupled out of the waveguide by grating. The length of output coupling
        grating is ~3 mm. From the surface scattered light intensity of the guiding
        path, the output coupling efficiency is estimated close to 100%. This is simply
        due to the longer interaction length associated with the longer output grating
        length. If multiple output grating couplers are employed along the waveguide
        and the grating parameters (i.e., depth, length, etc.) are adjusted such that the
        coupling efficiencies of the output gratings increase along the waveguide
        propagation direction, the uniform multistage optoelectronic interconnect can
        be realized,

        6.3.2. 45 SURFACE-NORMAL MICROMIRROR COUPLERS

          Another method of waveguide coupling utilizes total internal reflection
        mirrors, which are relatively wavelength insensitive and can be easily manufac-
        tured using reactive ion etching and photolithography. The input coupling
        efficiency of a micromirror coupler can be higher than 90% when a profile-
        matched input source is employed.
          Figure 6.27 shows the main processing steps for fabricating the polymer
        channel waveguide array and 45° TIR micromirror couplers. Two-layer struc-
        tured channel waveguides are first formed using standard processing steps
        described in the previous section. The 45° TIR micromirror couplers are
        formed within the channel waveguide by the reactive ion etching (RIE)
        technique. The detailed procedure is described below

          6.3.2.1. Fabrication Procedure
        I. Formation of the Mask to Perform RIE Process
          RIE (reactive ion etching) is used to form the 45° slanted surface acting as
        the micromirror coupler at the end of the waveguide channel. To make the RIE
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