Page 288 - Sami Franssila Introduction to Microfabrication

CMOS Transistor Fabrication 267

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12. Compare minimum CMOS inverter area for: ductor field-effect transistor with PtSi Schottky source/drain
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REFERENCES AND RELATED READINGS Yagishita, A. et al: Improvement of threshold voltage deviation
in damascene metal gate transistors, IEEE TED, 48(8)
Chesboro, D.G. et al: Overview of gate linewidth control in (2001), 1604, Figure 25.1.
the manufacture of CMOS logic chips, IBM J. Res. Dev., 39 IBM J. Res. Dev., 43(3) (1999): special issue on Ultrathin
(1995), 189. dielectric films.