Page 215 - Microsensors, MEMS and Smart Devices - Gardner Varadhan and Awadelkarim
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PROJECTION  METHOD    195

     E(x,  y, z)  =  E 0  allows the theoretical  shape  of the solidified polymer  after  projection to
     be  determined.
       Similar to scanning MSL, the fabrication precision  is related  to the exposure. In partic-
     ular, the curing depth  strongly  depends  on the  laser  exposure  as shown in Figure  7.29(b)
     (Nakamoto  and  Yamaguchi  1996).  The  lateral  dimension  is  slightly  influenced  by  the
     exposure  and  is  determined  mainly  by  the  mask  pattern  in  the  case  of  a  fixed  distance
     between  the  mask  and  resin  surface.
       Another  important  parameter  in  mask-projection  MSL  is  the  distance  between  the
     mask  and  the  resin  surface. A  large  distance  between  the  mask  and resin  surface results
     in  a  larger  lateral  dimension  because  of  diffraction  (Nakamoto  and  Yamaguchi  1996)
     (Figure  7.29(c)).  Therefore,  to  minimise  this  effect  and  obtain  the  highest  precision  in
     mask-projection MSL, the mask should be located  as close as possible to the resin  surface.
       An  example  of  a  micropart  fabricated  by  the  mask-projection  MSL  process  is shown
     in  Figure  7.30  (Nakamoto and  Yamaguchi  1996).
       The  fabrication  speed  of  mask-projection  MSL  is  much  faster  than  scanning  MSL  as
     stated  earlier.  But for complex  3-D microstructures, a large  number of masks are needed,
     and  this  process  is  not  only  time-consuming  but  also  expensive.  This  disadvantage can
     be  overcome  by  using dynamic  mask-projection  MSL.

                                                                      urn
                                                     500  250   0   250  500
                        Mask                                         , o' tlE
                                                                       l
                                                                 A
                                                             250-      =  15
                                                            Y      s
                                                             500-
                  Liquid                     500um        E  r-»_~—  \^—
                  photopolymer                               750-   60
                 (a)                   (b)
     Figure 7.29  Model  of  mask-projection  MSL  and  the  simulation  results  (a)  theoretical  model  of
     the  mask-based  method;  (b)  simulated  cross  section  of  a  solidified  polymer  (a  is  500  urn and  h  is
     1000 urn);  and  (c) cross section  of  the  solidified  polymer


















     Figure 7.30  Example of a polymer microstructure using mask-projection  MSL. From Nakamoto
     and  Yamaguchi  (1996)
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