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318    Cha pte r  Ei g h t

                        100
                         75
                         50
                         25
                          0
                        –25
                        –50
                        –75                                      (a)
                        100
                         75
                         50
                      (mC/m 2 )  25 0


                      D  –25
                        –50
                        –75                                      (b)
                        100
                         75
                         50
                         25
                          0
                        –25
                        –50
                        –75                                      (c)
                       –100
                          –180  –120   –60     0     60    120    180
                                            –E (MV/m)
               FIGURE 8.14  Displacement charge D vs. applied fi eld E hysteresis loop
               measurements. (a) Obtained with a 190 nm ferroelectric layer thickness and
               100 Hz frequency; (b) the same as (a) but at 1 Hz; (c) obtained with a
               ferroelectric layer thickness of 60 nm and a frequency of 1 Hz. (Reproduced
               with permission from Ref. 81. Copyright 2004, American Institute of Physics.)

               circuit is used, where the displacement is measured versus the applied
               field to obtain D–E hysteresis loops.
                   The D–E hysteresis loops for ITO/PEDOT:PSS/P(VDF-TrFE)/Au
               capacitors, which demonstrate square and symmetrical hysteresis
               loops are shown in Fig. 8.14. At high fields, polarization saturates
               with a remanent polaraization of 75 mC/m  and a coercive field of
                                                     2
               55 MV/m. Low-voltage (20 V) operating FeFETs with poly(3-
               hexylthiophene) as solution-processed semiconductor were demon-
               strated  as shown in Fig. 8.15. Retention times up to 1 week have
                     81
               been measured under floating gate conditions. One of the drawbacks of
               the floating gate operating mode is the slowing down of the retention
               loss because charges in the gate electrode are not free to exit the device.
               Unni et al. performed experiments under nonfloating conditions
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