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Intr oduction to System-on-Chip (SOC) 73
Timing closure
Power and
Die area Time-to-Market
signal integrity
Reliability
FIGURE 2.24 What is design closure?
requirements of the device, while at the same time ensuring that the critical time-to-
market goals are met. The complexity to enable this has been very well indicated by a
study that Collett International did back in 1999, shown in Figure 2.25, when it polled
several SOC design teams on the effort in terms of number of iterations they took to
solve this concurrent optimization problem and how this problem became worse as
DSM effects became more predominant below 180 nm.
As indicated earlier, technology scaling is causing feature sizes to become tinier and
tinier, as a result of which the electrical behavior of interconnect wires is becoming more
critical. As shown in Figure 2.16, while the wires are getting closer to each other, their
current carrying requirements have resulted in increased aspect ratios and thereby
much higher coupling capacitance between neighboring signals. When the signals in
the neighboring wires switch, the coupling capacitance causes a transfer of charge
between them. Depending upon the switching transition, significant crosstalk noise can
be generated that can cause both delays in the signal propagation as well as functional
problems due to glitches. Considering these physical aspects of the wires during
100% Number of
9% 11% 14% place & route
22% iterations
>10
>10
17% 15% >10
75% 35% 7% 6- 6- 6–10
9% 4- 4- 4–5
13%
27% 3 3 3
50% 27% 13% 2 2 2
50
26% 1 1 1
22%
28%
25%
28%
26%
12%
7%
4% 5% 7% 22%
0%
0%
0.25μ
<0.18μ
<0.18 0.25 0.35 μ 0.50 μ
0.50
Drawn feature size
D
FIGURE 2.25 Design closure complexity.