Page 203 - Sami Franssila Introduction to Microfabrication
P. 203

182 Introduction to Microfabrication



            Han, A. et al: A low temperature biochemically compatible  Sakakuchi, K. et al: Current progress in epitaxial layer trans-
                                                                    
              bonding technique using fluoropolymers for biochemical  fer (ELTRAN ), IEICE Trans. Electron., E80-C (1997),
              microfluidic systems, Proc. IEEE MEMS (2000), p. 414.  378.
            Henttinen, K. et al: Mechanically induced Si layer transfer in  Sakarya, S. et al: Technology of reflective membranes for
              hydrogen-implanted Si wafers, Appl. Phys. Lett., 76 (2000),  spatial light modulators, Sensors Actuators, A97–98 (2002),
              2370.                                       468.
            Huff, M.A. et al: Design of sealed cavity microstructures  Shivkumar, B. & C.-J. Kim: Microrivets for MEMS packaging,
              formed by silicon wafer bonding, J. MEMS, 2 (1993), p. 74  J. MEMS, 6 (1997), 217–225.
            Jourdain, A. et al: Investigation of the hermeticity of BCB-  Singh, A. et al: Batch transfer of microstructures using flip-
              sealed cavities for housing (RF-)MEMS devices, Proc. IEEE  chip solder bonding, J. MEMS, 8 (1999), 27.
              MEMS (2002), p. 677.                       Takao, H. et al: A CMOS integrated three-axis accelerometer
            Lee, B. et al: A study on wafer level vacuum packaging for  fabricated with commercial CMOS technology and bulk
              MEMS devices, J. Micromech. Microeng., 13 (2003), 663.  micromachining, IEEE TED, 48 (2001), 1961.
            Mack, S. et al: Analysis of bonding-related gas enclosure in  Tong, Q.-Y. & U. G¨ osele: Semiconductor Wafer Bonding, John
              micromachined cavities sealed by silicon wafer bonding, J.  Wiley & Sons, 1999.
              Electrochem. Soc., 144 (1997), 1106.       Tsau, C.T., S.M. Spearing & M.A. Schmidt: Fabrication of
            Niklaus, F. et al: Low-temperature full wafer adhesive bond-  wafer-level thermocompression bonds, J. MEMS, 11 (2002),
              ing, J. Micromech. Microeng., 11 (2001), 100–107.  641–647.
            Ramm, P. et al: Three dimensional metallization for vertically  Varma, C.M.: Hydrogen-implant induced exfoliation of silicon
              integrated circuits, Microelectron. Eng., 37/38 (1997), 39.  and other crystal, Appl. Phys. Lett., 71 (1997), 3519.
   198   199   200   201   202   203   204   205   206   207   208