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Integrated Pyr oelectric Sensors     155

               form a smooth and dense nanocomposite gate dielectric.  Pentacene is
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               used as the organic semiconductor material, the gate electrode is based on
               Al, while Au source and drain electrodes are employed. For the substrate
               glass or PET film, Melinex is used. The devices are fabricated according
               to the following procedure: the gate is formed by thermal evaporation of
               aluminum through shadow masks on a glass or PET substrate and the
               metal-oxide layer is fabricated by reactive sputtering of Al or Zr under
               high vacuum condition. Prior to the active organic semiconductor, a thin
               layer (~ 5 to 20 nm) of an appropriate hydroxyl-free polymer (PαMS or
               PVCi) was applied to the metal-oxide dielectric layer by spin-coating,
               thus forming a dense metal-polymer nanocomposite double layer as
               gate dielectric. Finally, for completion of the transistor device, 50 nm of
               pentacene is applied by thermal evaporation and structured via shadow
               masks at a rate of 0.1 nm/min and a substrate temperature of T  = 25°C.
                                                                  S
                   According to variable spectroscopic ellipsometry measurements
               done on the as-produced nanocomposite gate dielectrics but fabri-
               cated on silicon wafers, the measured layer thickness and optical con-
               stants can be modeled only if a mixed structure with club-shaped
               metal-oxide crystallites and interspaces filled by the polymer is
                       34
               assumed.  The club-shaped metal-oxide film growth with interspaces
               is clearly seen in the TEM micrograph (Fig. 4.23b). 34
                   In Fig. 4.24 atomic force microscopy (AFM) images of a ZrO /
                                                                       2
               PαMS nanocomposite gate dielectric-based transistor are displayed.
               The bare ZrO  metal-oxide surface is displayed in Fig. 4.24a, the nano-
                          2
               composite in Fig. 4.24b, and the pentacene layer grown on top of the
               nanocomposite dielectric in Fig. 4.24c. The AFM images clearly reveal
               that the rough (surface rms-roughness = 1.5 nm) and less dense ZrO
                                                                        2
               layer, which is composed of regularly clubbed grains (see Fig. 4.23b),
               smoothens by forming the nanocomposite (rms-roughness = 0.4 nm).
               The substrate roughness critically influences the growth dynamics of
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               pentacene molecules on top of dielectric surfaces,  grain sizes typically


                            15.00                15.00                50.00



                             0.00                0.00                 0.00




            400 nm               400 nm               1.0 μm
                    (a)                  (b)                 (c)

          FIGURE 4.24  Atomic force height images of (a) bare ZrO  metal oxide surface, (b) the
                                                   2
          nanocomposite, and (c) pentacene grown on top of the nanocomposite. (From Ref. 35.
          Copyright Wiley-VCH Verlag GmbH & Co. KGaA. Reproduced with permission.)
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