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PHYSICAL VAPOR DEPOSITION

13.22 WAFER PROCESSING

REFERENCES

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7. Suntola, T., Thin Solid Films, 216, 1992, p. 84.
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Academic Press, San Diego, 2001.
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10. Leskelä, M., et al. (eds.), Atomic Layer Epitaxy, Chap. 1, Blackie and Son, Glasgow, Scotland, 1990.
11. Juppo, M., “Atomic Layer Deposition of Metal and Transition Metal Nitride Thin Films and In Situ Mass
Spectrometry Studies,” Academic Dissertation, University of Helsinki, Laboratory of Inorganic Chemistry,
Helsinki, Finland, 2001.
12. Beyer, G., and M. Van Bavel, “Using Atomic Layer Deposition to Prepare Future-Generation Copper
Diffusion Barriers,” Micromagazine, 2002.

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