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Stacked ICs and Packages (SIP) 121
ASIC/memory
combo
Package stack
Chip stack Chip stack Package stack
2 Chip 3 Chip 4 Chip 5 Chip or more
Memory combo
Package stack
Chip stack
2 Chip 3 Chip 4 Chip 5 Chip or more
FIGURE 3.49 Selection of non-TSV SIP solutions. [53]
Figure 3.49 shows some guidelines to select chip versus package stackings. For a
small number of IC stacking (two or three chips), chip stacking is competitive for both
memory stacking and combined stacking of logic IC and memory. For stacking a higher
number of chips, chip stacking may still be competitive with a low cost for high-yielding
memory chips, but with expensive logic ICs combined with memory chips, package
stacking is definitely more preferable. In conclusion, balancing and optimizing cost,
flexibility, performance, form factor, and time-to-market will result in the optimal
application solution between chip and package stacking technologies.
3.4 TSV SIP
3.4.1 Introduction
The main drivers for 3D interconnections in packaging are (1) size reduction, (2) solving the
“interconnect bottleneck,” (3) heterogeneous integration of different technologies, and
(4) higher electrical performance. International Technology Roadmap for Semiconductors
(ITRS) has identified 3D IC stacking as a way to achieve better electrical performance
without further shrinking of transistor dimensions. Through-silicon via (TSV) has been
identified as one of the major technologies to achieve the above goals by 3D integration. A
TSV is a through-via hole drilled in silicon (die, wafer, or Si chip carrier) and filled with
conductor material to form vertical electrical interconnections in modules or subsystems.
TSVs run through the silicon die and are used to connect vertically stacked dies, wafers, or
Si chip carriers.
Figure 3.50 shows the historical trend in system integration leading to TSV-enabled
3D integration. The first 2D interconnect is an example of horizontal integration