Page 240 - Sami Franssila Introduction to Microfabrication
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Sacrificial and Released Structures 219










                                   (a)                (b)              (c)

           Figure 22.3 Electroplated free-standing structure: (a) first resist patterning and seed metal deposition; followed by a
           second, thick resist patterning; (b) electroplating and (c) development of the second resist, seed metal etching and removal
           of the first resist


                                   Anchor              in a single structural layer process, though multiple
                                    Flexure (length L,  structural layers are often used, which will be discussed
                                    width W, thickness t)  shortly.

                                                       22.3 STICTION

                                                       The release etch process looks like a simple isotropic
                                                       etch but it has many difficulties not associated with
           Drive                              Sense    isotropic patterning etching. Etch time control is difficult
           comb                    Suspended  comb     because etch front propagation under the structural layer
                                   shuttle (mass M)    cannot usually be observed. The etch process is diffusion
                                                       limited in nature and it slows down in long and narrow
                               (a)                     release gaps.
                                                         A serious limitation for a wet release process
                                                       comes from stiction (from ‘sticking + friction’): during
                                                       drying, the capillary force strength exceeds the spring
                                                       force of the released structures and the free-standing
                                                       cantilever/bridge/diaphragm makes contact with the
                                                       substrate and adheres to it.
                                                         Stiction prevention has the following three alterna-
                                                       tive approaches:

                                                       1. Dry release: If silicon is used as sacrificial material,
                                                         isotropic SF 6 plasma and XeF 2 gas are suitable. If
                                                         oxide is used, anhydrous HF vapour can be used,
                                                         but its etch rate is lower than that of aqueous HF.
                                                         If photoresist is used as the sacrificial material, then
                                                         oxygen plasma can be used for removal.
                                                       2. Surface engineering: Stiction depends on surface
                              (b)
                                                         smoothness (on microscale), flatness (on macroscale)
           Figure 22.4 (a) Comb drive with suspended shuttle mass.  and surface chemistry (just like wafer bonding).
           From Bustillo, J. et al. (1998), by permission of IEEE. (b)  Corrugated or otherwise patterned surfaces can
           SiC comb drive on silicon wafer. Plate release has been  prevent stiction. This approach requires extra process
           aided by using perforations in the plate. Reproduced from  steps that need to be integrated into the process
           Roy, S. et al. (2002), by permission of IEEE  flow (Figure 22.5). Alternatively, the surfaces can be
                                                         coated with hydrophobic coatings, for example, self-
                                                         assembled monolayers (SAMs) or plasma-deposited
             A comb drive with interdigitated fixed and movable  fluoropolymers.
           (released but anchored) electrodes is a versatile sensor  3. Phase engineering: Sublimation and supercritical
           and actuator (Figure 22.4). Comb drives can be made  drying sidestep normal liquid drying. In sublimation,
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