Page 46 - Rashid, Power Electronics Handbook
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3 Thyristors                                                                                         31

                 latching current I . If the thyristor is already in forward-
                                 L
                 conduction and the anode current is reduced, the device can
                 move its operating mode from forward-conduction back to
                 forward-blocking. The minimum value of anode current
                 necessary to keep the device in forward-conduction after it
                 has been operating at a high anode current value is called the
                 holding current I . The holding current value is lower than
                                H
                 the latching current value as indicated in Fig. 3.3.
                   The reverse thyristor characteristic, quadrant III of Fig. 3.3,
                 is determined by the outer two junctions (J and J ), which are
                                                    1    3
                 reverse-biased in this operating mode (applied n  is nega-
                                                          AK
                 tive). Symmetric thyristors are designed so that J will reach
                                                          1           FIGURE 3.4  Cross section showing a ¯oating ®eld ring to decrease the
                 reverse breakdown due to carrier multiplication at an applied  electric ®eld intensity near the curved portion of the main anode region
                 reverse potential near the forward breakdown value (operating  (leftmost p -region).
                                                                              þ
                 point ‘‘3'' in Fig. 3.3). The forward- and reverse-blocking
                 junctions are usually fabricated at the same time with a very
                                                                      depletion region results in electric ®eld crowding along the
                 long diffusion process (10 to 50 h) at high temperatures                þ

                 (>1200 C). This process produces symmetric blocking prop-  curved section of the p -diffused region. The ®eld crowding
                                                                      seriously reduces the breakdown potential below that expected
                 erties. Wafer-edge termination processing causes the forward-                                        þ
                                                                      for the bulk semiconductor. A ¯oating ®eld ring, an extra p -
                 blocking capability to be reduced to  90% of the reverse-  diffused region with no electrical connection at the surface, is
                 blocking capability. Edge termination is discussed in what
                                                                      often added to modify the electric ®eld pro®le and thus reduce
                 follows. Asymmetric devices are made to optimize forward-
                                                                      it to a value below or at the ®eld strength in the bulk. An
                 conduction and turn-off properties, and as such reach reverse
                                                                      illustration of a single ¯oating ®eld ring is shown in Fig. 3.4.
                 breakdown at much lower voltages than those applied in the
                                                                      The spacing W between the main anode region and the ®eld
                 forward direction. This is accomplished by designing the
                                                                      ring is critical. Multiple rings can also be employed to further
                 asymmetric thyristor with a much thinner n-base than is
                                                                      modify the electric ®eld in high-voltage rated thyristors.
                 used in symmetric structures. The thin n-base leads to
                                                                        Another common method for altering the electric ®eld at
                 improved properties such as lower forward drop and shorter
                                                                      the surface is to use a ®eld plate as shown in cross section in
                 switching times. Asymmetric devices are generally used in
                 applications when only forward voltages (positive n AK  ) are to  Fig. 3.5. By forcing the potential over the oxide to be the same
                                                                                          þ
                 be applied (including many inverter designs).        as at the surface of the p -region, the depletion region can be
                   The form of the gate-to-cathode VI characteristic of SCRs  extended so that the electric ®eld intensity is reduced near the
                                                                                                þ
                 and GTOs is similar to that of a diode. With positive gate bias,  curved portion of the diffused p -region. A common practice
                                                                      is to use ®eld plates with ¯oating ®eld rings to obtain
                 the gate-cathode junction is forward-biased and permits the
                                                                      optimum breakdown performance.
                 ¯ow of a large current in the presence of a low voltage drop.
                                                                        High-voltage thyristors are made from single wafers of Si
                 When negative gate voltage is applied to an SCR, the gate-
                                                                      and must have edge terminations other than ¯oating ®eld
                 cathode junction is reverse-biased and prevents the ¯ow of
                                                                      rings or ®eld plates to promote bulk breakdown and limit
                 current until avalanche breakdown voltage is reached. In a
                 GTO, a negative gate voltage is applied to provide a low
                 impedance path for anode current to ¯ow out of the device
                 instead of out of the cathode. In this way the cathode region
                 (base-emitter junction of the equivalent npn transistor) turns
                 off, thus pulling the equivalent npn transistor out of conduc-
                 tion. This causes the entire thyristor to return to its blocking
                 state. The problem with the GTO is that the gate-drive
                 circuitry is typically required to sink  10% of the anode
                 current in order to achieve turn-off.
                 3.3.2 Edge and Surface Terminations
                 Thyristors are often made with planar diffusion technology to
                 create the anode region. Formation of these regions creates
                 cylindrical curvature of the metallurgical gate-cathode junc-  FIGURE 3.5  Cross section showing a ®eld plate used to reduce the
                 tion. Under reverse bias, the curvature of the associated  electric ®eld intensity near the curved portion of the p -region (anode).
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